Cryogenic Hydrogen Purifier – ULTRAL H2
A cost-effective alternative to Getter-type purifiers for purifying gaseous hydrogen to sub-ppb levels
ULTRALTM H2 is a purifier application specially designed for the purification of gaseous hydrogen. The adsorption technology employed allows the removal of impurities such as CO, CO2, H20, CH4, Ar and including the normally difficult to remove N2 down to sub-ppb levels. The purification principle is based on the reversible cryo-trapping of impurities on a high performance adsorbent bed.
Range
Model No. |
20/100 |
100/300 |
300/1250 |
Max flow rate (Nm3/h) |
100 |
300 |
1250 |
Min flow rate (Nm3/h) |
4 | 12 | 25 |
LN2 consumption (l/h) |
5 | 16 | 60 |
Max electricity consumption (kW) |
6 | 11 | 17 |
Key benefits
- Fully-automated easy-to-use purifier with touch screen control
- Two purification columns operating in parallel to ensure continuous purification of hydrogen 24h/7
- Technology that includes automatic regeneration of the purification columns: no cartridges to change
- Purifier operating at cryogenic temperature (-196°C) while in purification mode instead of the 420°C typical of a getter, leading to increased safety
- Technology with the flexibility to handle variations in flow rate and/or impurity levels with no change in delivered performance
- One of the lowest operating costs on the market
Main technical characteristics
- Working pressure: between 5 and 17 (28 bar optional)
- Flow rate: between 20 and 1,250 Nm3/h (depending on the model)
- Pressure loss: < 1.3 bars (at 7 bars on input)
- Regeneration of columns by hot nitrogen
Performance
Impurities |
Input (ppm) |
Output (ppb) |
N2 |
500 | <1 |
O2 |
5 | <1 |
CO2 |
5 | <1 |
H2O |
5 | <1 |
CO |
5 | <1 |
Standards
- CE - ASME - AQSIQ (China) - KGS (Korea)
References
- STMICROELECTRONICS
- GLOBAL FOUNDRIES
- ATMEL
- IMEC
- ON SEMICONDUCTOR
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