ULTRALTM H2 are cryogenic purifiers with a flow capacity range of 5 to 650 Nm3/Hr that offer continuous and reversible purification of hydrogen for applications of very high purity.

ULTRALTM H2 is a purifier application specially designed for the purification of gaseous hydrogen. The adsorption technology employed allows the removal of impurities such as CO, CO2, H20, CH4 and including the normally difficult to remove N2 down to sub-ppb levels. The purification principle is based on the reversible cryo-trapping of impurities on a high performance adsorbent bed.

Range

Model No.	5/20	20/100	100/300	300/650
Max flow rate (Nm3/h)	20	100	300	650
Min flow rate (Nm3/h)	1	4	12	25
LN2 consumption (l/h)	2	5	16	45
Max electricity consumption (kW)	6	6	11	17

Electronics & Optoelectronics documentation

PDF - 1.88 MB

Key benefits

Fully-automated easy-to-use purifier with touch screen control
Two purification columns operating in parallel to ensure continuous purification of hydrogen 24H/da
Technology that includes automatic regeneration of the purification columns: no cartridges to change!
Purifier operating at cryogenic temperature (-196°C) while in purification mode instead of the 420°C typical of a getter, leading to increased safety!
Technology with the flexibility to handle variations in flow rate and/or impurity levels with no change in delivered performance
One of the lowest operating costs on the market

Main technical characteristics

Working pressure: between 5 and 18 bars
Flow rate: between 5 and 650 Nm3/Hr (depending on the model)
Pressure loss: < 1.3 bars (at 7 bars on input)
Regeneration of columns by hot nitrogen
Performance levels:

Impurities	Input (ppm)	Output (ppb)
N2	500	< 1
O2	5	<1
CO2	5	<1
H2O	5	<1
CO	5	<1

Operating costs:

Standards

CE - ASME - AQSIQ (China) - HPGSL (Japan)

References

STMICROELECTRONIC
AMD
ATMEL
IMEC
ON SEMICONDUCTOR

Markets

Solutions

Services

About us

Contact us

Markets

Aerospace

Space

Science

Solutions

Services

About us

Press

Resources